Metal complex materials for ALD/CVD

Under Development


MOCVD and atomic layer deposition (ALD) are used for forming thin film layers in the field of electronics and semiconductors. UBE has developed a variety of precursors used in these formation methods using its proprietary composite and purification technology. UBE has a wide variety of materials ranging from metal materials (Ru, Co, Mn, etc.) used in wires, barriers and electrodes to materials (Al, Mg, Fe, Zn, etc.) for insulation and passivation films.(Under Development)

Uses and Packaging

  • Cylinders: Supplied in quantities from 100ml as needed.
  • Stainless steel cylinders
  • Semiconductor wires
  • Base coating for semiconductor wires
  • Semiconductor electrodes
  • Semiconductor insulations(Oxide film, Nitride film)
  • Passivations


Products Inquiry
  • Ube Industries, Ltd.
  • Chemicals Company,
  • Battery Materials and Fine Chemicals Div.
  • High Purity Chemicals Gr.
  • Phone : +81(3)5419-6181
  • Fax : +81(3)5419-6259
  • Products Inquiry Form